X-Ray Fluorescence (XRF) Measuring Systems for Wafer Testing

Specific X-ray Fluorescence Measuring Instruments (XRF) for Measurements and Analyses of Coating Thicknesses and Compositions on Wafers

• Measurements on structures on wafers in the electronics and semiconductor industries
• Analysis of very thin coatings, e.g., gold/palladium coatings of ≤ 0.1 µm (0.004 mils)
• Determination of complex multi-coating systems
• Automated measurements, e.g., in quality control

• Equipped with polycapillary X-ray optics for measurements on very small components
• Measurement spot approx. ø 20 µm (0.8 mils) fwhm at Mo-Ka
• Very high intensities and thus good precision even for thin coatings, measurement uncertainty < 1 nm possible
• Programmable, motor-driven XY table with vacuum wafer chuck for silicon wafers up to ø 300 mm (12 in)

• Universally applicable high performance instrument due changeable apertures and primary filters, micro-focus X-ray tube and silicon drift detector
• Equipped with a vacuum chmaber for maesurements in vacuum, in ambient air or with helium purge (optional)
• Programmable, motor-driven XY table, maximum travel 100 x 100 x 100 mm (3.94 x 3.94 x 3.94 in)